Publications

2011

• Functionalized nanoporous track-etched b-PVDF membrane electrodes for lead(II) determination by square wave anodic stripping voltammetry
  
  • Bessbousse Haad
  • Nandhakumar Iris
  • Decker Maxime
  • Barsbay Murat
  • Cuscito Olivia
  • Lairez Didier
  • Clochard Marie-Claude
  • L Wade Travis
  Analytical Methods, Royal Society of Chemistry, 2011, pp.1351. Track-etched functionalized nanoporous b-PVDF membrane electrodes, or functionalized membrane electrodes (FMEs), are electrodes made from track-etched, poly(acrylic acid) (PAA) functionalized nanoporous b-poly(vinylidene fluoride) (b-PVDF) membranes with thin porous Au films sputtered on each side as electrodes. In order to form the b-PVDF nanoporous membranes, b-PVDF films are irradiated by swift heavy ions. After irradiation, radical tracks are left in the membranes. Etching removes some of the radical tracks revealing nanopores. The remaining radicals initiate radio grafting of PAA from the pore walls of the nanoporous b-PVDF. PAA is a cation exchange polymer that adsorbs metal ions, such as Pb 2+ , from aqueous solutions thus concentrating the ions into the membrane. After a calibrated time, the FME is transferred to an electrochemical cell for analysis. A negative potential is applied to the Au film of the FME for a set time to reduce the adsorbed ions onto the Au film working electrode. Square-wave anodic stripping voltammetry was performed on the FME to determine the Pb 2+ ion concentration in the original solution based on calibration. The zero current intercept of the calibration for Pb 2+ is 0.13 ppb (mg L À1) and three times the sample blank deviation (3S/ N) is 0.050 ppb. (10.1039/c1ay05038a)
  DOI : 10.1039/c1ay05038a
• Radiation damage induced at the surface of titanium by argon ions of a few MeV
  
  • Do N.-L.
  • Bérerd N.
  • Moncoffre N.
  • Yang F.
  • Trocellier P.
  • Serruys Y.
  • Gorse-Pomonti D.
  Journal of Nuclear Materials, Elsevier, 2011, 419, pp.168-176. Oxide films thermally grown on titanium in a weakly oxidizing environment (5 × 10−3 Pa of dry air) under irradiation with 2, 4 and 9 MeV argon have been studied. The AFM study reveals a cratering effect of 2, 4 and 9 MeV argon and a significant surface roughening effect of 2 MeV argon, both effects being largely unexpected in this energy range. The XPS analysis shows that the TiO2 stoichiometry of the superficial oxide film is fairly well maintained under argon irradiation. The Spectroscopic Ellipsometry analysis reveals an oxide film thickness multiplied by a factor of three under irradiation with 2 MeV argon by comparison with 9 MeV argon, the irradiation effect on oxide growth remaining very limited for 4 or 9 MeV argon. The possible role of the electronic but most certainly of the nuclear energy losses on the surface damage mechanism are discussed. It is suggested that the oxidizing environment is necessary to freeze the instantaneous surface damage and permits the post-mortem observation. (10.1016/j.jnucmat.2011.07.012)
  DOI : 10.1016/j.jnucmat.2011.07.012